Litografía por Haz de Láser
The µPG systems are extremely economical and easy to use micro pattern generators for direct writing applications and low volume mask making. Due to the small footprint and compact design these µPG systems can be installed in the smallest area without loss of perfomance which gives you the maxium flexibility.
µPG 101 – Tabletop Micro Pattern Generator. The µPG 101 is a flexible and intuitive to use lithography tool that will accelerate your research and make an easy first contact with Maskless Lithography.
µPG 501 – Tabletop Maskless Aligner System. The high throughput and excellent performance of this tool will eliminate the need for standard mask aligner for many R&D applications.
The capabilities and flexibility of these systems make them the ultimate lithographic research tools in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.
DWL 66+ – The Ultimate R&D Laser Lithography Tool. The new DWL 66+ laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing.
DWL 2000/ DWL 4000 – Direct Write Lithography Systems. The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. In addition to 2D patterns, the state of the art technology of the system can also create complex 3D structures in thick photoresist with a single pass.
The new Volume Pattern Generator (VPG) line of large area lithography systems is a milestone in technological innovation and product development from Heidelberg Instruments, based on a patented fast exposure process parallelization.
VPG 200/VPG 400 – Maskless Aligner Systems. The VPG 200 and VPG 400 laser lithography systems are economical, high resolution pattern generator for low volume mask making and direct writing.
VPG 800/VPG 1100/VPG 1400 – Ultimate Lithography Production Tools. The VPG 800/1100/1400 line of laser lithography systems is an cost effective solution for the fabrication of high resolution photomasks up to 1400 mm x 1400 mm
We are experts in the development of maskless lithography systems for new and special applications:
Lithography for Special Susbtrates