We recently installed a MiniLab 125 platform magnetron sputtering system in the James Watt Nanofabrication Centre (JWNC) at the University of Glasgow. The system had a base pressure of 5 × 10-8 mbar and contained 3 sources for 3” targets, pre-deposition etch cleaning and a load-lock.
In part, the instrument will be used for creating Bragg reflector stacks on GaAs substrates—and the tool was factory-proven for this. While having no ion beam source and supplying RF power (pulsed DC is more typical), expert hardware design and Moorfield’s in-house process capability allowed us to install the tool with repeatable >60% reflectance at 765 nm, as required by JWNC.ç
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