The core technology of the VersaProbe III is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Standard features include PHI’s patented dual beam charge neutralization technology, a floating column Ar ion gun for XPS sputter depth profiling, and a fully automated internet ready instrument platform. Multi-technique options include a scanning electron gun for submicron surface analysis by Auger Electron Spectroscopy and a UV lamp for Ultra-violet Photoelectron Spectroscopy measurements.
New features available with VersaProbe III include a 128 channel detector, a new SmartSoft user interface, and optional 20 kV C60+, and 20 kV Ar2500+ cluster source ion guns for polymer and organic thin film analysis.
The Quantera II is built upon the revolutionary technologies Physical Electronics (PHI) introduced with the Quantum 2000 including: a patented micro-focused scanning x-ray source, patented dual beam charge neutralization technology, a floating column ion gun for XPS sputter depth profiling, flexible robotic sample handling, and a fully automated internet ready instrument platform. The Quantera II increases the performance and productivity of these revolutionary technologies, providing the highest performance XPS system available to meet your current and future XPS needs.
The PHI X-tool is the newest member of PHI’s suite of XPS instruments that also includes the PHI Quantera II and PHI VersaProbe II. The X-tool is designed to make XPS instrumentation accessible to a larger audience. An intuitive touch screen user interface, automatic sample loading, automatic analysis, and automatic report generation removes the requirement to be a surface analysis expert to perform XPS measurements.
Based on PHI’s patented scanning XPS microprobe technology, the X-tool provides a robust environment for performing routine small and large area XPS measurements.